However, to avoid damage as well as contamination from implanted Ga ions, we used e-beam-assisted deposition. We note that the Pt deposited from the decomposition of the high carbon-containing

precursor is not pure Pt. Instead, it is a composite of carbon and Pt, which has been analysed before by our group for its physical characteristics and compositional details [10]. Electrical measurements The metallic contacts at the ends lead to the Schottky barrier (SB) formation in the junction region (see Figure 1b). The resulting MSM device can be modelled as two back-to-back Schottky diodes (SB1 and SB2) at the ends with a Si NW with resistance R NW connecting them. The current passing through such a device is mainly controlled check details by the barrier heights φ 1 and φ 2 at the two contacts SB1 and SB2, respectively. This device configuration also enabled us to do two-probe as well as four-probe measurements on the same Si NW, which then allows us to find the contact resistance R C, an important device parameter. The area of contact, A C, can be obtained from the SEM image of a given device from which a reliable estimate of specific contact resistivity ρ C = A C R C can be obtained. Figure 2a shows the non-linear and asymmetrical I − V characteristics of a typical device made from a single Si NW with diameter of approximately 50 nm. At the highest device current of 10 µA, the current density is ≈ 2.5 ×104 A/cm2, which is much less than the electromigration

damage threshold. The Cobimetinib in vitro nanowire used has a resistivity at room temperature ρ 300K = 290 m Ω.cm. Comparison of the ρ with the resistivity of bulk Si gives us an estimate of carrier density n ≈ ×1017/cm3. The non-linearity at low bias is a signature of the Schottky-type contacts. The asymmetric nature of the I − V

curves arises because of φ 1 ≠ φ 2. This inequality arises from the likely differences in the surface conditions at the two contacts (M-S) that will determine the actual value of the barriers. The bias-dependent current I has been fitted with the equation for back-to-back Schottky very diodes connected by a resistor [11] (1) Figure 2 I − V characteristics and specific contact resistance. (a) The I − V characteristics at 300 K where the solid line shows a fitted curve using Equation 1 (see text). (b) The variation of specific contact resistivity with bias voltage. where V ′ = V − I R NW, R NW. (In the equation above, φ 1 is related to the terminal with V+ve.) I 0 arises from thermoionic emission. The I − V data at low bias (< 0.5 V) as well as the fit to the data are shown in Figure 2a (solid line). Equation 1 fits the I − V data well, and we could obtain the barrier heights. For the data shown in Figure 2a, φ 1≈ 0.1 eV and φ 2≈ 0.04 eV. From the contact resistance R C measured as a function of bias, as depicted before, we obtained the bias-dependent specific contact resistance ρ C in Figure 2b. With increase of bias, ρ C is substantially reduced (by nearly a factor of 2).